Electroless Ni(Nickel) Plating
MS-NI 100
Type
MS-100 M, A, B, C(4Type)
Characteristic
Satisfy RoHS regulation for high brightness.
Phosphorus(%)
9-11
Explanatory
pH
4.5-4.8
Temp(℃)
88-92
㎛/hr
14-17
MS-211
Type
MS-211 M, A, B, C(4Type)
Characteristic
Satisfy RoHS regulation for electronic parts, aluminum deep processing.
Semi-brightening plating chemicals.
Phosphorus(%)
7~9
Explanatory
pH
4.5~5.0
Temp(℃)
85~92
㎛/hr
14-19
MS-NI 150
Explanatory
pH
4.5-4.9
Temp(℃)
79~85
㎛/hr
10-13
Type
MS-150 M, A, B, C(4Type)
Characteristic
Electroless Nickel plating solution for PCB.
Phosphorus(%)
7~9
MS-411
Type
MS-411 M, A, B, C(4Type)
Characteristic
Satisfy RoHS regulation for electronic parts, aluminum deep processing.
Semi-brightening/ brightnening plating chemicals.
Phosphorus(%)
7~9
Explanatory
pH
4.5-5.1
Temp(℃)
88-92
㎛/hr
14-21
MS-511
Type
MS-511 M, A, B, C(4Type)
Characteristic
Low phosphorus type neutralized electrless nickel solution.
For non conductor such as glass and ceramics.
Phosphorus(%)
3~5
Explanatory
pH
5.6-6.2
Temp(℃)
86-92
㎛/hr
8-10
MS-600
Type
MP-600 M, A, B, C(4Type)
Characteristic
Satisfy RoHS regulation.
Low phosphorus type neutralized electrless nickel solution.
Phosphorus(%)
3~5
Explanatory
pH
5.5~6.2
Temp(℃)
60~70
㎛/hr
5~8
MS-611
Type
MS-611 M, A, B, C(4Type)
Characteristic
Satisfy RoHS regulation.
High phosphorus type.
Phosphorus(%)
12-13
Explanatory
pH
4.4-4.8
Temp(℃)
86-92
㎛/hr
6-9
MS-400
Type
MS-400 M, A, B, C(4Type)
Characteristic
Satisfy RoHS regulation. / High phosphorus type.
phosphorus(%)
10~12
Explanatory
pH
4.4~4.8
Temp(℃)
86~92
㎛/hr
6~10
MS-811
Type
MS-811 A, B, C(3Type)
Characteristic
DMAB type. Not containing phosphorus. / High phosphorus type.
Boran(%)
1
Explanatory
pH
6.0~6.5
Temp(℃)
60-65
㎛/hr
6~10
KINICO-207
Type
KINICO-207 M, N, A, B(4Type)
Characteristic
Ni, Co alloy electroless plating solution.
Cobalt(%)
30%
Explanatory
pH
4.4~4.8
Temp(℃)
78~86
㎛/hr
5~7
MS-NW
Type
MS-NWL / NWM / NW35 M, A, B, C, W(5Type)
Characteristic
Ni-W-P(ternary) solution
Tungsten(%)
1%, 3~5%, 7~9%
Explanatory
pH
8.6~9.2
Temp(℃)
80~90
㎛/hr
6-8
MS-NISI
Type
MS-NISI A, B(2type)
Characteristic
Sillicon wafer
Explanatory
pH
9.0~9.3
Temp(℃)
78~85
㎛/hr
-